| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668966 | Surface and Coatings Technology | 2005 | 5 Pages |
Abstract
TiO2 thin films have been prepared by mist plasma evaporation (MPE) on Si(111) substrates at atmospheric pressure using titanium chloride aqueous solution as precursor. The effects of substrate temperature (Ts), deposition time and precursor concentration on the morphology of the films were investigated. The films were rutile TiO2. Ts and precursor concentration affected the morphology of the films remarkably. Grain size of the films increased with the increase of Ts, deposition time and precursor concentration.
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Authors
Hui Huang, Xi Yao,