| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10669784 | Thin Solid Films | 2012 | 4 Pages |
Abstract
⺠Crystalline Ge thin films have been grown on SrTiO3 substrate by sputtering. ⺠Orientation of Ge films can be controlled by the substrate temperature. ⺠Substrate temperature affects interfacial diffusion. ⺠Formation of Ge oxide layers at the interface at higher substrate temperatures.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Wensheng Deng, Ming Yang, Jianwei Chai, Ten It Wong, Anyan Du, Chee Mang Ng, Yuanping Feng, Shijie Wang,