| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10669820 | Thin Solid Films | 2012 | 6 Pages |
Abstract
⺠Broadband transmission masks for EUV proximity and interference lithography. ⺠Technology for free standing niobium membranes with areas up to 1 mm2. ⺠High density patterns with periods of 100 nm and structure sizes below 40 nm. ⺠Measured diffraction efficiency at 11 nm is in agreement with the theory. ⺠Produced masks can be effectively used with wavelengths between 6 nm and 17 nm.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
S. Brose, S. Danylyuk, L. Juschkin, C. Dittberner, K. Bergmann, J. Moers, G. Panaitov, St. Trellenkamp, P. Loosen, D. Grützmacher,