| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10669849 | Thin Solid Films | 2012 | 6 Pages |
Abstract
⺠Effects of oxygen and argon plasma cleaning of gold film electrodes are examined. ⺠Oxygen plasma chemically cleans the surface without damaging it. ⺠Pentane sliptime is larger after oxygen plasma compared to untreated surface. ⺠Argon plasma produces pores and defects in the gold film.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
D. Berman, J. Krim,