| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10669850 | Thin Solid Films | 2012 | 8 Pages |
Abstract
⺠We study the optical properties of SiNx:H films annealed at a high pressure. ⺠After annealing at 1130 °С, 5 h, the SiN1.3 film contains hydrogen. ⺠Films annealed under high pressure showed changes in their photoluminescence spectra.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
V.A. Volodin, K.O. Bugaev, A.K. Gutakovsky, L.I. Fedina, M.A. Neklyudova, A.V. Latyshev, A. Misiuk,