| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10669891 | Thin Solid Films | 2012 | 7 Pages |
Abstract
⺠TiO2 films are deposited on glass at 25 °C by successive ionic layer adsorption and reaction method with a rate of 4.6 Ã
/cycle. ⺠The films nucleate in an island mode initially but grow in a layer mode afterwards. ⺠The SILAR TiO2 films nucleation period is five cycles. ⺠Electron paramagnetic resonance spectroscopy shows that TiO2 films paramagnetic defects are attributed to oxygen vacancies. ⺠They will decrease by anneal or ultraviolet radiation and form hydroxyl or superoxide radicals.
Related Topics
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Materials Science
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Authors
Yiyong Wu, Yaping Shi, Xianbin Xu, Chengyue Sun,