Influence of thickness on the crystallography and surface topography of TiN nano-films deposited by reactive DC and pulsed magnetron sputtering

Article ID	Journal	Published Year	Pages	File Type
10669932	Thin Solid Films	2012	7 Pages	PDF

Abstract

âº 50Â nm and 500Â nm thick TiN films are applied by continuous and pulsed sputtering. âº All the films are polycrystalline and mono-phase. âº 50Â nm films have a strong {111} in plane crystallographic texture. âº During growth texture weakens and crystal perfection and surface smoothness increase. âº The surfaces are smoother when the films are applied by pulsed sputtering.

Keywords

Pulsed magnetron sputtering Reactive magnetron sputtering Crystallographic texture titanium nitride Surface roughness Crystallographic structure atomic force microscopy X-ray diffraction