| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10669962 | Thin Solid Films | 2012 | 5 Pages |
Abstract
⺠We study thermal properties of TiO2 films grown by atomic layer deposition (ALD). ⺠dn/dT is negative for thin films and takes positive values for relatively thicker ones. ⺠Films are denser than ones grown by other techniques such as evaporation.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
M.R. Saleem, P. Silfsten, S. Honkanen, J. Turunen,