| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10669977 | Thin Solid Films | 2012 | 7 Pages |
Abstract
⺠Effective nickel platinum (NiPt) selective etching process by piranha chemistry ⺠Higher electrochemical potential promotes β-Pt oxide formation. ⺠Stronger fluid kinetic and rapid voltammetric cycle enhance Pt etching rate. ⺠5% Pt, 120-200 Ã
NiPt and 10% Pt, 100-180Â Ã
NiPt silicide conditions verified ⺠Wafer surface damage is reduced through shorter NiPt selective etch process cycle.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Ming Mao Chu, Jung-Hua Chou,