| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10670034 | Thin Solid Films | 2012 | 6 Pages |
Abstract
⺠Films are deposited from an equimolar AlBCrSiTi target in various argon/nitrogen atmospheres at different substrate temperatures. ⺠We provide an alternative approach for producing amorphous nitride films with high thermal stability up to 700 oC for 2 h. ⺠At annealing temperatures of 800 oC and above, the amorphous films transform into a simple NaCl-type face-centered cubic solid solution. ⺠Even after annealing at 1000 °C for 2 h, the grain size is only 2 nm.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Che-Wei Tsai, Sih-Wei Lai, Keng-Hao Cheng, Ming-Hung Tsai, Andrew Davison, Chun-Huei Tsau, Jien-Wei Yeh,