Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10670072 | Thin Solid Films | 2012 | 8 Pages |
Abstract
⺠Thin Ru films can be grown by ALD from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen. ⺠Growth of Ru is enhanced on Si at low temperatures and on oxides at high temperatures. ⺠HfO2 is the most favoring substrate for the nucleation of ruthenium.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Kaupo Kukli, Jaan Aarik, Aleks Aidla, Indrek Jõgi, Tõnis Arroval, Jun Lu, Timo Sajavaara, Mikko Laitinen, Alma-Asta Kiisler, Mikko Ritala, Markku Leskelä, John Peck, Jim Natwora, Joan Geary, Ronald Spohn, Scott Meiere, David M. Thompson,