| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10670072 | Thin Solid Films | 2012 | 8 Pages |
Abstract
⺠Thin Ru films can be grown by ALD from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen. ⺠Growth of Ru is enhanced on Si at low temperatures and on oxides at high temperatures. ⺠HfO2 is the most favoring substrate for the nucleation of ruthenium.
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Authors
Kaupo Kukli, Jaan Aarik, Aleks Aidla, Indrek Jõgi, Tõnis Arroval, Jun Lu, Timo Sajavaara, Mikko Laitinen, Alma-Asta Kiisler, Mikko Ritala, Markku Leskelä, John Peck, Jim Natwora, Joan Geary, Ronald Spohn, Scott Meiere, David M. Thompson,