Article ID Journal Published Year Pages File Type
10670113 Thin Solid Films 2012 6 Pages PDF
Abstract
► Selective removal of C from W-C deposits using H2 plasma at rather low temperature. ► Critical parameters obtained for C removal keeping other properties intact. ► Narrow range of temperatures for C removal before Fe6W7 compound formation.
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Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
Preview
Interaction of highly dissociated low pressure hydrogen plasma with W-C thin film deposits
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