| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10670248 | Thin Solid Films | 2012 | 5 Pages |
Abstract
⺠Oblique angle deposition of ZnO thin films by magnetron sputtering. ⺠X-ray diffraction measurement of crystal size, density, orientation, and stress. ⺠When the deposition angle exceeds 40° grains grow at an angle to the substrate. ⺠Crystal orientation does not change with the oblique angle. ⺠1.3 Pa Ar gas pressure was found to be the most optimum value.
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Authors
S. Mukhtar, A. Asadov, W. Gao,