| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10670309 | Thin Solid Films | 2012 | 5 Pages |
Abstract
⺠Nickel oxide thin films deposited by reactive direct current magnetron sputtering. ⺠Nickel oxide thin films deposited without intentional heating. ⺠Two electrical transitions observed with increasing oxygen content. ⺠Deposition of polycrystalline NiO thin films with controlled growth of the structure. ⺠NiO p-type semiconductor and transparent thin films.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
A. Karpinski, A. Ferrec, M. Richard-Plouet, L. Cattin, M.A. Djouadi, L. Brohan, P.-Y. Jouan,