Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10670532 | Thin Solid Films | 2011 | 6 Pages |
Abstract
Multilayer lithium tantalate thin films were deposited on Pt-Si [Si(111)/SiO2/TiO2/Pt(111)] substrates by sol-gel process. The films were annealed at different annealing temperatures (300, 450 and 650 °C) for 15 min. The films are polycrystalline at 650 °C and at other annealing conditions below 650 °C the films are in amorphous state. The films were characterized using X-ray diffraction, atomic force microscopy (AFM) and Raman spectroscopy. The AFM of images show the formation of nanograins of uniform size (50 nm) at 650 °C. These polycrystalline films exhibit spontaneous polarization of 1.5 μC/cm2 at an application of 100 kV/cm. The dielectric constant of multilayer film is very small (6.4 at 10 kHz) as compared to that of single crystal.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
S. Satapathy, Prabha Verma, P.K. Gupta, Chandrachur Mukherjee, V.G. Sathe, K.B.R. Varma,