Nanostructuration of self-assembled poly(styrene-b-isoprene-b-styrene) block copolymer thin films in a highly oriented pyrolytic graphite substrate

Highly oriented pyrolitic graphite (HOPG) is a useful substrate to visualize epitaxial formation due to its crystallographic structure. The morphology of a poly(styrene-b-isoprene-b-styrene) block copolymer thin film on a HOPG substrate was investigated by atomic force microscopy. Block copolymer domains generated a morphology with triangular regularity. This arrangement was induced by the HOPG substrate structure due to van der Waals attraction between the HOPG π-conjugated system and aromatic ring of polystyrene domains. However, increasing the film thickness, the substrate effect on the surface morphology decreased. As a consequence, film surfaces showed the coexistence of different structures such as highly aligned cylinders and perforated lamellae. When film thickness exceeded a threshold value, the substrate did not have effect in the surface arrangements and the surface showed a similar morphology to that existing in bulk.