Article ID Journal Published Year Pages File Type
10670664 Thin Solid Films 2005 5 Pages PDF
Abstract
Tungsten oxide films with varied substoichiometry were deposited by reactive DC-sputtering from a W target at different oxygen partial pressures. The inherent maximum achievable electrochemical colouration and electrocolouration were found to be dependent on the oxygen content and consequently on the film substoichiometry. These results were related to those obtained in a previous study by colouration with hydrogen spillover from a catalyst (gasochromic colouration) of films fabricated in the same way. A clear analogy among the colouration by the three different techniques appeared.
Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
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