| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10672557 | Ultramicroscopy | 2011 | 9 Pages |
Abstract
⺠We study the effect of Ar+ ion milling parameters on standard TEM sample quality. ⺠We introduce interlocking as a parameter for the evaluation of TEM sample quality. ⺠The resulting amorphous layer thickness and interlocking are directly proportional to the acceleration voltage of the ion beam. ⺠Preparation time is indirectly proportional to the incident angle of the ion beam. ⺠Model approximations fit the experimental data very well at low voltage and angle.
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Authors
M.J. Süess, E. Mueller, R. Wepf,