| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10672574 | Ultramicroscopy | 2011 | 4 Pages |
Abstract
⺠We present a new AFM based approach to measure the local dielectric response. ⺠It is based on the measurement of the second harmonic of the photosensor signal. ⺠This approach allows reaching unprecedented broad frequency range (2-3Ã104 Hz). ⺠The method was tested on different poly(vinyl acetate) (PVAc) films.
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Authors
G.A. Schwartz, C. Riedel, R. Arinero, Ph. Tordjeman, A. AlegrÃa, J. Colmenero,