Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10673075 | CIRP Annals - Manufacturing Technology | 2010 | 4 Pages |
Abstract
A magnetic field-assisted finishing process has been studied for high-aspect-ratio ion-etched silicon curvilinear micropore structures, which have potential application as mirrors for satellite-borne X-ray telescopes. The micropore sidewalls act as X-ray focusing mirrors, and lead to reductions in the mass-to-effective-area ratio of 10-1000 times, compared to traditional X-ray telescopes. This paper describes the processing principle for the surface finishing of the sidewalls of micropore structures (10, 20 μm and depth: 300 μm (aspect ratio â 15, 30)), and the feasibility of achieving roughness â¼4 nm rms and improving the X-ray reflectivity of micropore sidewall surface are demonstrated.
Keywords
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Physical Sciences and Engineering
Engineering
Industrial and Manufacturing Engineering
Authors
H. Yamaguchi, R.E. Riveros, I. Mitsuishi, U. Takagi, Y. Ezoe, N. Yamasaki, K. Mitsuda, F. Hashimoto,