Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10673151 | CIRP Annals - Manufacturing Technology | 2012 | 4 Pages |
Abstract
We propose a novel one-shot layer-by-layer microstereolithography method using evanescent light to achieve submicrometer spatial process resolution. Theoretical and experimental analyses focusing on the vertical process resolution confirm that a layer of submicrometer thickness can be photopolymerized with good thickness controllability (standard deviation of 10Â nm) and that the proposed method of using evanescent light is compatible with layer-by-layer stereolithography.
Related Topics
Physical Sciences and Engineering
Engineering
Industrial and Manufacturing Engineering
Authors
S. Takahashi, Y. Kajihara, K. Takamasu,