Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10673358 | CIRP Annals - Manufacturing Technology | 2015 | 4 Pages |
Abstract
A new concept for the laser-assisted removal of material is proposed for achieving nanoscale correction in next-generation functional microstructures such as nanostructured photoresist surfaces and micro 3-D objects fabricated using microstereolithography. This proposed method is characterized by the entrapment of TiO2 photocatalyst nanoparticles by a remotely controlled radiation force, which allows not only for remote processing using the inherent properties of light, but also a fine process resolution that goes beyond the limits of diffraction focusing. Both theoretical and experimental analyses are used to verify the basic feasibility of this proposed concept.
Related Topics
Physical Sciences and Engineering
Engineering
Industrial and Manufacturing Engineering
Authors
S. Takahashi, Y. Horita, F. Kaji, Y. Yamaguchi, M. Michihata, K. Takamasu,