Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10674794 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2013 | 4 Pages |
Abstract
A 13.56Â MHz inductively coupled plasma based RF ion source is developed for production of high brightness focused ion beams of heavy gaseous elements for high speed milling and light ions for high speed imaging. In order to obtain ion beams with low emittance, no magnetic field of any kind is used in the ion source. However, to achieve the high plasma density, the plasma chamber volume is reduced to couple RF power as high as 8-12Â W/cm3 to the plasma. Measurements show that the normalized rms emittance of 0.6Â mA Ar1+ beam to be as low as 0.0075Â mm-mrad while it is 0.004Â mm-mrad for 1.2Â mA of ion beam from hydrogen plasma. With a simple parallel plate extraction system with an aperture of 2Â mm diameter, 80Â mA/cm2 of ion beam from hydrogen plasma could be extracted at 3.5Â kV extraction potential and 300Â W of RF power. The ion source has been operated with other heavy gases and results show that more than 1Â mA of xenon and krypton ion beam could easily be extracted at 5Â kV extraction potential and 200Â W of RF power. In this article, the capability of the ion source to produce high current, low emittance heavy as well as light ion beams is presented.
Related Topics
Physical Sciences and Engineering
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Authors
Ranjini Menon, P.Y. Nabhiraj,