Article ID Journal Published Year Pages File Type
10674885 Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2011 4 Pages PDF
Abstract
We perform first-principles calculations to investigate the stress effects on stability and diffusion of H in W. Both the solution energy and the diffusion barrier of H decrease with increasing tensile stress. We show that the stress will not alter the site preference and the relative stability, with ∼0.4 eV stress-independent energy difference between the TIS and the OIS. We demonstrate the solution and the diffusion of H in W becomes more difficult under the applied compressive stress, which theoretically provides a possible way to suppress the H retention in W.
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
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