| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10675478 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2005 | 6 Pages |
Abstract
Diffusion of cesium in borosilicate glass has been studied by heavy ion Rutherford backscattering spectrometry (HIRBS) technique using 30 MeV 19F beam. Analysis of glass samples annealed at different temperatures for 12 h duration has been used to determine the activation energy of diffusion of cesium in borosilicate glass, which is considered as one of the suitable matrices for vitrification of the high level radioactive waste. Diffusion coefficients show Arrhenius behaviour in the temperature range 473-673 K. The activation energy for diffusion is found to be 22.2 ± 3.6 kJ/mol.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
B.S. Tomar, Sumit Kumar, V.K. Shrikhande, G.P. Kothiyal G.P. Kothiyal,