Article ID Journal Published Year Pages File Type
10676114 Vacuum 2012 5 Pages PDF
Abstract
► Effect of magnetic flux density of Ag sputter target on plasma parameters was studied. ► Langmuir probe system was used for the evaluation. ► The electron energy and density of plasma decreased using high magnetic flux density. ► The resistivity of Ag thin films decreased using high magnetic flux density. ► This resistivity improvement related to the plasma parameter changes.
Keywords
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
Preview
Plasma parameter analysis of Ag sputter deposition using cathodes with different magnetic flux densities
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