Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10676159 | Vacuum | 2005 | 7 Pages |
Abstract
The Cu/Ti multilayer (ML) films were deposited on Si(1 0 0) and Si(1 1 1) substrate with a series of pair layers with Vanguard sputtering system. The influences of periodic number and substrate structure on UV-reflectivity of Cu/Ti superlattice films were investigated carefully. The result shows that the Cu/Ti ML films have clear layer-structure. The ML films deposited on Si(1 0 0) and Si(1 1 1) have UV-reflectivity of about 90% and 67% at 200 nm, respectively, but they have lower soft X-ray reflectivity of about 1.9% at 13.04 nm in terms of wavelength, with near normal incidence of 5°. The transmission microscope image indicates that the fabricated Cu/Ti ML films have superlattice structure.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Chengtao Yang, Shuren Zhang, Jiahui Luo, Yan Li, Yanrong Li,