Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10676233 | Vacuum | 2011 | 4 Pages |
Abstract
Auger electron (AES) and directional elastic peak electron (DEPES) spectroscopies were used to investigate the Co/Cu(111) interface. The change in the Auger Cu (M2,3VV transition at 66Â eV) peak intensity (hCu) recorded at room temperature shows that the Co growth mechanism is not a layer by layer type. This proves that Co does not wet the Cu substrate. The recorded DEPES profiles reveal the coexistence of fcc and hcp Co structures already at an early stage of growth (0.8Â ML). The Co coverage increase leads to the reduction of intensities associated with the fcc structure and significant increase of the signal from the hcp structure. The comparison between experimental and theoretical data at large coverages (43Â ML) shows a major contribution of the hcp structure within the Co layers in the recorded DEPES profiles.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
D. Turko, I. Morawski, M. Nowicki,