Interfacial reactions in Mo-Zr multilayer structure: an X-ray reflectivity study

The effect of elevated temperature on the structural stability and alloy formation in Mo-Zr multilayers is investigated. Mo-Zr multilayers deposited by the electron beam evaporation technique under ultra-high vacuum conditions are annealed up to 650 °C. The changes induced due to thermal treatment are observed using X-ray reflectivity (both specular and off-specular) and X-ray diffraction techniques. The Mo-Zr multilayers remained as an insoluble layered structure even after annealing as revealed from X-ray reflectivity measurements. The interfacial roughness is found to be very similar at all interfaces and decreases on annealing. The multilayer structure remains intact on annealing with expansion of the multilayer period and a marginal increase in X-ray reflectivity.