| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10676274 | Vacuum | 2005 | 4 Pages |
Abstract
In order to obtain a compact-structure, saving-energy and good-property system based on the conventional microwave electron-cyclotron resonance chemical vapor deposition (MWECR-CVD) system, we proposed a new technique using a magnetic field combination of an electromagnetic coil and a permanent magnet unit, as well as adopting a dedicated microwave coupling structure. The experiment results showed that by using this new optimized system the deposition rate can reach more than 2.5Â nm/s, and the photosensitivity of a-Si:H films can be up to 1.1Ã105.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Chen Guang-Hua, Zhu Xiu-Hong, Yin Sheng-Yi, Hu Yue-Hui, Zhang Wen-Li,