Article ID Journal Published Year Pages File Type
10676301 Vacuum 2005 7 Pages PDF
Abstract
These results are discussed in terms of structural changes and network formation in thin HSQ films. They prove that a process combining high developer concentration and low baking temperature is preferable for fabrication of high resolution patterns using HSQ as a negative tone EB resist.
Keywords
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
Preview
Surface roughness of hydrogen silsesquioxane as a negative tone electron beam resist
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