Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10676482 | Vacuum | 2005 | 8 Pages |
Abstract
We review the operation of a ferroelectric plasma source (FPS) with enhanced plasma density and of high-current hollow cathode (HC) and hollow anode (HA) discharges. Different schemes (arc sources, magnetron and FPS) were used for ignition and sustaining the HC and HA discharges with current amplitude ⩽4 kA.These discharges are characterized by a positive anode potential with respect to the hollow electrode walls and the plasma density and temperature inside the hollow electrode cavity reach â¼3Ã1019mâ3 and ⩽12 eV, respectively. It was shown that the incorporation of the FPS in the HA and HC enables one to develop a compact high-current electron source. The characteristics of an electron diode with FPS, HA and HC were studied under an accelerating voltage ⩽250 kV and â¼400 ns pulse duration. It was shown that these sources allow the generation of an electron beam with a cross-sectional area of 0.01 m2 and amplitude up to 1-2 kA.
Keywords
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Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Ya. E. Krasik, J.Z. Gleizer, A. Krokhmal, K. Chirko, A. Sayapin, J. Felsteiner, V. Bernshtam, V.I. Gushenets,