Article ID Journal Published Year Pages File Type
10707775 Journal of Crystal Growth 2005 7 Pages PDF
Abstract
(Ba0.50Sr0.50)TiO3 (BST) thin films were deposited on Pt(1 1 1)/Ti/SiO2/Si(1 0 0) substrates without and with LaNiO3 (LNO) bufferlayer prepared by pulsed laser deposition (PLD). The BST thin films directly grown on Pt/Ti/SiO2/Si substrates without and with LNO bufferlayer exhibited highly (1 0 0) and (1 1 0) orientation, respectively. The dielectric constant of the 800-nm-thick BST films with LNO bufferlayer was 1010 at 1 MHz, which was higher than that of BST film with non-bufferlayer (∼851). Also, the tunabilities of BST thin films with (1 0 0)- and (1 1 0)-orientation were ∼63% and ∼62%, respectively, at the applied field of 262.5 kV/cm. Improved dielectric constant has been attributed to LNO bufferlayer.
Related Topics
Physical Sciences and Engineering Physics and Astronomy Condensed Matter Physics
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