Production of nanostructured magnetic materials using holographic lithography

The magnetic properties of Co, Ni and NiFe sub-micrometric structures produced by holographic lithography and sputtering techniques are investigated. The structures were obtained using a mask previously recorded by holography in a photo-resist film coated on a quartz substrates. After this procedure, the magnetic material was deposited using the sputtering technique, and the photo resist was removed by lift-off. Samples with thicknesses of around 500 Å were grown in stripes structures and periodicity of 800 nm. The results indicate that the samples with Co and NiFe present exchange bias effect and this is due the surface oxidation.