Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
11027361 | Journal of Pharmaceutical and Biomedical Analysis | 2019 | 30 Pages |
Abstract
It is highly desirable to have a universal detector that can detect all types of compounds and give a uniform response regardless of the physiochemical properties of the compounds. With such a universal detector, all components in a sample can be accurately quantified without the need for individual standards. This is especially needed for the characterization of unknowns and for non-targeted analysis, or for samples that have no isolated standards available for each component. Over the years, much effort has been put into seeking a universal detection technology. In this review, we discuss the commonly used detectors for analytical characterization, including UV, RI, ELSD, CAD, CLND, FID, VUV, MS, NMR, and hyphenated detection, with the focuses on the “universal” features of these detectors regarding the types of molecules they can detect and the uniformity of responses.
Keywords
VUVTFAECDAPPIDADGMPqTOFHRMSTCDPMTVOCELSDAPCIqHNMRNLSDFTICRQCDCLNDRSDQqQESINQADNano quantity analyte detectorChemiluminescent nitrogen detectorLIFEPAnuclear magnetic resonanceqNMRcharged aerosol detectorPhotodiode array detectordiode array detectorElectron capture detectorthermal conductivity detectorEvaporative Light Scattering Detectorflame ionization detectorTrifluoroacetic acidEicosapentaenoic aciddocosahexaenoic acidUltravioletElectrochemicalrelative standard deviationElectron impactVolatile organic compoundNMRCharacterizationGood Manufacturing PracticeFIDDHAFourier transform ion cyclotron resonancequantitative nuclear magnetic resonancequadrupole time-of-flightRefractive indexCADMass spectrometryHigh resolution mass spectrometryResponse factorPhoto Multiplier TubeReversed-phaseLaser-induced fluorescenceHILICQualificationPADGas chromatographyQuantificationelectrospray ionizationchemical ionizationatmospheric pressure chemical ionization
Related Topics
Physical Sciences and Engineering
Chemistry
Analytical Chemistry
Authors
Kelly Zhang, Kenji L. Kurita, Cadapakam Venkatramani, David Russell,