| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 12039541 | Materials Letters | 2019 | 15 Pages |
Abstract
The nanoscale design of metallic multilayer thin films is one crucial factor that greatly influences the kinetics, often inducing unusual phase transformations. Metastable or amorphous phases may directly form in as-deposited films of certain thicknesses, which is common for Ni/Ti multilayers. Atom probe tomography and X-ray diffraction analyses are performed here to study the interdiffusion and structural changes as a function of the bilayer thickness in Ni/Ti multilayers. The films are deposited by DC magnetron sputtering with near 50:50 compositions. Multilayers with 5â¯nm bilayer thickness are found to be highly intermixed, with compositions up to â¼25â¯at.% for both diffuser metals, inducing amorphization reactions during deposition.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Hisham Aboulfadl, Fabian Seifried, Michael Stüber, Frank Mücklich,