| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1233641 | Spectrochimica Acta Part A: Molecular and Biomolecular Spectroscopy | 2009 | 5 Pages |
Abstract
The photothermal detection technique is an innovative and non-contact method to investigate the properties of films on workpieces. This paper describes a novel experimental set-up for thickness microscopy based on photothermal radiometry. The correlation between the thermal wave signal and the film thickness is deduced and evaluated to determine the film thickness with a lateral resolution of less than 1 mm. Results indicate that the thickness microscopy is a useful method to characterize thin films and has the potential to be applied in-process.
Related Topics
Physical Sciences and Engineering
Chemistry
Analytical Chemistry
Authors
Liping Wang, Helmut Prekel, Hengbiao Liu, Yanzhuo Deng, Jiming Hu, Gert Goch,