| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1239773 | Spectrochimica Acta Part B: Atomic Spectroscopy | 2015 | 4 Pages |
•Hard disk storage media top layer was analyzed by TRXPS.•Argon etched, burnished, and unburnished samples have been characterized by TRXPS and compared.•TRXPS only characterized the top layer (about 2 nm) constituents with enhanced sensitivity.•TRXPS is demonstrated as a reproducible quality control method for HDD top layer chemical analysis.
Photoelectron spectra from a typical hard disk storage media device (HDD) were measured at total reflection and non-total reflection at unburnished, acetone-cleaned, and argon-sputtered conditions. F, O, N, and C usually making the upper layer of a typical hard disk medium were detected. Enhancement of the photoelectron emission of the fluorocarbon lubricant was observed at total reflection. Pt and Co were only found by non-total X-ray photoelectron spectroscopy (XPS) because they are constituents of a deeper region than the top and interface regions. Argon-sputtered, ultrasonic acetone-cleaned, and unburnished top layers were compared at total and non-total reflection conditions. Total reflection X-ray photoelectron spectroscopy (TRXPS) is demonstrated to be a powerful tool for storage media lubrication layer chemical state analysis, reliable for industrial quality control application , and reproducible.
