Article ID Journal Published Year Pages File Type
1241145 Spectrochimica Acta Part B: Atomic Spectroscopy 2008 5 Pages PDF
Abstract
The relation between measurement results (surface coverage, throughput, low limit of detection, limit of quantification, quantification of localized contamination) and Sweeping Total reflection X-ray Fluorescence parameters (number of measurement points and integration time per point) is presented in details. In particular, a model is proposed to explain the mismatch between actual surface contamination in a localized spot on wafer and Total reflection X-ray Fluorescence reading. Both calibration and geometric issues have been taken into account.
Related Topics
Physical Sciences and Engineering Chemistry Analytical Chemistry
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