| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1241394 | Spectrochimica Acta Part B: Atomic Spectroscopy | 2007 | 4 Pages |
Abstract
Capabilities of the KMC-2 beamline at BESSY for spatially resolved X-ray measurements with micro- and nanometer resolution have been reviewed. A combination of experimental methods of X-ray fluorescence analysis and extended X-ray absorption fine spectroscopy with X-ray standing waves technique was applied for the depth profiling of Si/W/Si layers with sub-nanometer resolution. The investigated layers were placed into the waveguide structure formed by two Au films to increase sensitivity and accuracy of the measurements. In-depth resolution on the order of 1 nm for the structure measurements has been obtained.
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Physical Sciences and Engineering
Chemistry
Analytical Chemistry
Authors
A. Gupta, N. Darowski, I. Zizak, C. Meneghini, G. Schumacher, A. Erko,