Platinum OMCVD processes and precursor chemistry

Chemical Vapor Deposition (CVD) is an advanced manufacturing technology for surface coating currently enjoying intense development. Particularly, platinum Organometallic Chemical Vapor Deposition (OMCVD) is a technique allowing the formation of platinum thin films as a fine dispersion of platinum particles. This article reviews the current knowledge of platinum OMCVD and relates all the factors investigated in its recent development. Appreciable progress has been made during the two last decades due to varied experimentations with precursors and operating conditions. The different techniques (e.g. LCVD, PECVD, IACVD, EBCVD, FBCVD) used for platinum OMCVD are described with extended discussions about their own advantages and drawbacks, each technique being consistent with particular applications. The influence of gases, solvents and substrates will be discussed through many examples leading to the comprehension of growth and nucleation mechanisms in the platinum deposits. Attention is focused particularly on the behaviour in CVD of the various organometallic precursors and their own performances. The results obtained are detailed in terms of conditions, growth rate, purity and resistivity in order to give a full scope to this domain.