Article ID Journal Published Year Pages File Type
1324024 Journal of Organometallic Chemistry 2006 6 Pages PDF
Abstract

Reaction of the thermally stable silylene Si[(NCH2But)2C6H4-1,2] (1) [abbrev. as Si(NN)] with SiX4 (X = Cl or Br) afforded the disilanes (NN)SiX(SiX3) and [(NN)SiX]2 (X = Br only), the trisilane (NN)SiX-[(SiX3)Si(NN)] and the monosilane (NN)SiX2 (X = Br only), whereas treatment of 1 with MCl4 (M = Ge or Sn) yielded (NN)SiCl2 and MCl2. [(NN)SiBr]2 and (NN)SiBr2 were also obtained by reaction of 1 with Br2. Reaction of 1 with PhSiCl3 yielded the disilane (NN)SiCl(SiCl2Ph) and trisilane [(NN)SiCl]2SiClPh, whereas the disilane (NN)SiCl(SiCl2Me) was obtained with MeSiCl3. The trisilane (NN)SiCl-[(SiCl3)Si(NN)] was thermally labile and converted to [(NN)SiCl]2SiCl2.

Graphical abstractReactions of the thermally stable silylene Si[(NCH2But)2C6H4-1,2] (1) [abbrev. as Si(NN)] with SiX4 (X = Cl or Br), RSiCl3 (R = Me or Ph) and Br2 are described, which afforded di- and trisilanes, such as, e.g., 2, 3, 5–7 and 9. Reaction of 1 with MCl4 (M = Ge or Sn) yielded (NN)SiCl2 and MCl2.Figure optionsDownload full-size imageDownload as PowerPoint slide

Related Topics
Physical Sciences and Engineering Chemistry Inorganic Chemistry
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