Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1326337 | Journal of Organometallic Chemistry | 2007 | 4 Pages |
A novel inorganic polymer resin with high photosensitivity was prepared by grafting acrylate functional groups onto the backbone of polyvinylsilazane through a reaction with methyl-2-(bromo-methyl)acrylate via the highly efficient electrophilic substitution of allyl bromide. The as-modified polymer was characterized by 1H NMR and 2D-1H–1H NMR (COSY) methods to determine the reaction mechanism. Differential photocalorimetry, FT-IR spectroscopy and TGA were used to examine its properties. The modified polyvinylsilazane is a promising inorganic polymer photoresist with a high UV sensitivity and a 55% ceramic yield, which is useful for fabricating non-oxide ceramic microstructures using mold free photocuring shaping processes.
Graphical abstractA new synthetic route for the acrylated polyvinylsilazane, as an inorganic polymer photoresist with a relatively high UV sensitivity, was developed using a highly efficient electrophilic substitution reaction between the secondary amine and the allyl bromide.Figure optionsDownload full-size imageDownload as PowerPoint slide