Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1403015 | European Polymer Journal | 2008 | 6 Pages |
Abstract
The influence of processing conditions and polymer architecture on pattern transfer in capillary force lithography (CFL) using poly(ferrocenylsilane) etch resists is investigated. Zero-shear-rate viscosities measured at different temperatures and for polymers with different molar masses are related to the quality of CFL patterns, assessed based on atomic force microscopy experiments. An optimal range of viscosities corresponding to appropriate molar masses and processing temperatures is established. In this range, polymers possess enough mobility allowing for reasonably quick surface pattern formation. Yet, the polymers are not too mobile and preserve their shape when quenched to below Tg prior to serving as etch resist masks.
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Authors
Igor Korczagin, Hong Xu, Mark A. Hempenius, G. Julius Vancso,