| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1414910 | Carbon | 2011 | 4 Pages |
Abstract
The deposition of nickel/amorphous carbon (Ni/a-C) films by a hybrid plasma process combining magnetron sputtering of a Ni target and plasma enhanced chemical vapor deposition using methane gas has been investigated. The formation of nickel nanowires encapsulated by a-C matrix has been demonstrated by transmission electron microscopy (TEM). The obtained nanowires array can be easily dispersed or can be simply converted to a Ni-filled CNT array by annealing at 350 °C as confirmed by TEM analysis. The developed fabrication method of Ni-filled CNT array is a low temperature technique compatible with substrates of low melting point.
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Energy (General)
Authors
A.A. El Mel, E. Gautron, B. Angleraud, A. Granier, P.Y. Tessier,