Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1417857 | Carbon | 2009 | 8 Pages |
Abstract
We effectively tailored the charge trapping and transport behavior of a carbon nanotube field effect transistor memory device using charge interaction with underlying Ge nanoparticles in a HfO2 high-κ dielectric. We also suggest a new route for modulating the Schottky barrier at the nanotube–electrode interface with localized charge trapping in discrete nanoparticles. This modification leads to an effective increase in the read-out conductance ratio of two to three orders magnitude under low voltage operation, associated with a large memory window of ∼5.3 V. Furthermore, we achieved a more controllable and reliable memory effect due to stable charge storage in deep nanoparticle traps, as compared to shallow HfO2 defect states.
Related Topics
Physical Sciences and Engineering
Energy
Energy (General)
Authors
Mei Yin Chan, Li Wei, Yuan Chen, Lap Chan, Pooi See Lee,