Conductivity of poly(2-methoxyaniline-5-phosphonic acid)/amine complex and its charge dissipation property in electron beam lithography

•Conductivity for amine complexes of poly(2-methoxyaniline-5-phosphonic acid) (PMAP) (up to 10 S m−1).•Higher conductivity of PMAP compared to poly(2-methoxyaniline-5-phosphonic acid monoethyl ester) (PMAPE).•Efficient charge dissipation property of PMAP/pyridine (1:2) and PMAP/{CF3CH2NH2/NH3 (4:1)} (1:3) complexes in the electron beam lithography.

The present study summarizes the conductivity of the drop-cast film for various amine complexes of the novel self-doped polyanilines bearing phosphonic acid, poly(2-methoxyaniline-5-phosphonic acid) (PMAP) and poly(2-methoxyaniline-5-phosphonic acid monoethyl ester) (PMAPE). The conductivity was revealed to depend on the kind and amount of the amine base. The tendency of PMAP and PMAPE complexes was similar, but the PMAP ones exhibited the higher conductivity than the PMAPE ones. In the case of the pyridine and CF3CH2NH2 complexes of PMAP, the conductivity more than 10 S m−1 was kept even in the presence of four equivalents of the amine based on the phosphonic acid moiety. The charge dissipation property of the PMAP/pyridine (1:2) complex was also investigated qualitatively by top-coating a resist on a quartz substrate in the electron beam lithography. The obtained pattern clearly showed the charge dissipation property. Use of PMAP/{CF3CH2NH2/NH3 (4:1)} (1:3) complex made it possible with the development using only water in place of an aqueous NMe4OH solution.

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