Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1445921 | Acta Materialia | 2014 | 7 Pages |
Abstract
This work is focused on the electrical and optical analyses used to estimate the activation energy of the dominant shallow donor in thin ZnO films obtained at low temperature by the atomic layer deposition process. These two approaches, based on the temperature-dependent classical Hall effect and photoluminescence investigations, yielded a donor activation energy ED in the range of 30–40 meV, including the estimated error margins. This value, as confirmed by layer composition studies, is attributed to the presence of zinc atoms in the interstitial positions of the ZnO lattice.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Tomasz A. Krajewski, Krzysztof Dybko, Grzegorz Luka, Elzbieta Guziewicz, Piotr Nowakowski, Bartlomiej S. Witkowski, Rafal Jakiela, Lukasz Wachnicki, Agata Kaminska, Andrzej Suchocki, Marek Godlewski,