Article ID Journal Published Year Pages File Type
1446200 Acta Materialia 2013 11 Pages PDF
Abstract

This study focuses on the role of strain and thin film epitaxy on the semiconductor-to-metal transition (SMT) characteristics of single crystalline VO2 thin films. The VO2/TiO2 heterostructures of controlled orientations were epitaxially grown on m-cut, r-cut and c-cut sapphire substrates. Detailed structural investigations were performed using high-resolution X-ray diffraction (2θ–θ and φ scans) and high-resolution transmission electron microscopy techniques to correlate SMT properties with microstructural characteristics. Monoclinic (M1) VO2 thin films with (1 0 0), (0 0 1) and (2¯01) out-of-plane orientations were grown on TiO2(1 0 1)/r-sapphire, TiO2(1 0 0)/c-sapphire and TiO2(0 0 1)/m-sapphire platforms, respectively. The in-plane alignments across the interfaces were established to be [0 1 0](1 0 0)VO2||[0 1 0](1 0 1)TiO2, [1 0 0](0 0 1)VO2||[0 0 1](1 0 0)TiO2 and [010](2¯01)VO2‖[010](001)TiO2 for r-sapphire, c-sapphire and m-sapphire substrates, respectively. We were able to tune the SMT temperature of VO2 epilayers from ∼313 K to 354 K (bulk Tc ≈ 340 K). The SMT characteristics were interpreted based upon the residual strain in the VO2 lattice, particularly along the c-axis of tetragonal VO2. This research introduces the VO2-based single crystalline heterostructures as a potential candidate for a wide range of applications where different transition temperatures are required.

Related Topics
Physical Sciences and Engineering Materials Science Ceramics and Composites
Authors
, , , , , , ,