Microstructure evolution of Ti–Si–C–Ag nanocomposite coatings deposited by DC magnetron sputtering

Nanocomposite coatings consisting of Ag and TiCx (x < 1) crystallites in a matrix of amorphous SiC were deposited by high-rate magnetron sputtering from Ti–Si–C–Ag compound targets. Different target compositions were used to achieve coatings with a Si content of ∼13 at.%, while varying the C/Ti ratio and Ag content. Electron microscopy, helium ion microscopy, X-ray photoelectron spectroscopy and X-ray diffraction were employed to trace Ag segregation during deposition and possible decomposition of amorphous SiC. Eutectic interaction between Ag and Si is observed, and the Ag forms threading grains which coarsen with increased coating thickness. The coatings can be tailored for conductivity horizontally or vertically by controlling the shape and distribution of the Ag precipitates. Coatings were fabricated with hardness in the range 10–18 GPa and resistivity in the range 77–142 μΩ cm.